Drive faster results with improved accuracy.
Drive intuitive solutions and increased user productivity.
Drive creativity and enable rapid innovation.
Enabling customers to accelerate time-to-market to meet the rising chip demand.
Developing innovative and reliable solutions to enable advanced functionality and next node technology.
Adding and expanding solutions for improving chip reliability and yield.
Improving designer efficiency and ease of use to optimize productivity and accelerate user learning curves.
The Calibre products have employed machine learning and artificial intelligence algorithms to improve both the quality of results and the user experience. Click the tabs to see some milestones of Calibre intelligence through the years.
Calibre trusted technology delivers intelligent solutions to address leading challenges in semiconductor design. Calibre AI initiatives focus on reduced cycle times, increased innovation, higher reliability and improved ease-of-use.
Calibre offers designers multiple model-based checking options to fit in any design flow:
Prepacked models: trained with foundry data and deployed as a ready to run solution for the end user.
Adaptable models: Pretrained by Calibre and fine-tuned with customer data to deliver flexible model-based checking capability for optimizing design manufacturability.
DIY Custom models: Comprehensive feature extraction and machine learning tools are embedded in the Calibre infrastructure to train and deploy custom model-based applications within a Calibre verification flow.
Calibre has embedded AI technology for intelligently utilizing hardware resources during a run.
Expert guidance for the optimal Calibre setup adapted to the layout, process design kit (PDK), and user environment and objectives.
Accelerate the DRC debug process through intelligent results analysis tools that cluster errors to increase the probability of a designer identifying a repeatable fix or systematic design issue.
Stay tuned for Calibre’s new advanced visualization engine that will launch in 2025!
The Calibre DesignEnhancer layout optimization tool combines intelligent design optimization techniques with Calibre’s core verification engine for automated drc-clean design-stage IC optimizations.
Calibre Manufacturing Solutions offers an extensive AI/ML infrastructure to improve the entire post-tapout flow.
Neural net assisted modeling for resist, mask and etch optimizes litho-patterning model accuracy while maintaining performance.
Applying AI to OPC and RET solutions to improve turn-around time.
ML-based checking for hotspot prediction/detection
Process driven, design content informed, yield debugging and process optimization.
Faster process development using intelligent pattern generation.
Combining Calibre SONR and LSG Synthetic Layout generation technology offers:
The best-in-class Calibre Cluster Manager offers predictability and efficiency in tape-out operations.
Learn how Calibre intelligence helps you engineer a smarter future faster.
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We help you adopt, deploy, customize and optimize your complex design environments. Direct access to engineering and product development lets us tap into deep domain and subject matter expertise.
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knowledgebase, product updates, documentation, support cases, license/order information and more.
Across all process nodes and design styles, the Calibre toolsuite delivers accurate, efficient, comprehensive IC verification and optimization, while minimizing resource usage and tapeout schedules.