The insatiable demand for integrated circuits (ICs) continues to drive smaller critical dimensions. Photolithography processes, including extreme ultraviolet (EUV), present ever more complexity and data volume. Our computational lithography solutions enable cost-effective technology enablement.
Both the lithographic challenges and the computational complexity associated with advanced process nodes create a need for advanced capabilities in computational lithography software and hardware. The Calibre solution offers best-in-class accuracy, speed, and cost of ownership.