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Calibre Curvilinear Solutions

Calibre is the industry leader in providing curvilinear data preparation solutions. Calibre offers a complete end-to-end solution including all steps from retargeting to SRAF, OPC, MPC, and MDP that addresses the curvilinear mask generation needs of specialty applications (SiPh) and memory designs.

Get in touch with our technical team 1-800-547-3000

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Calibre is leading the way to curvy masks

Learn how curvilinear mask shapes provide larger lithography entitlement than traditional rectilinear masks and became a viable option for IC manufacturing. Explore the ways your company can best use Calibre to embrace the cost-efficient manufacturing solution for curvilinear masks.

Calibre curvilinear solutions products

Calibre offers an industry-leading curvilinear mask solution with efficient data representation format and curvilinear tools to provide high-quality, cost-saving curvilinear data preparation in the post-tapeout flow.

A demonstration of how Calibre nmCLBIAS provides smooth biasing results and quality rule-based retargeting for curvilinear designs
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Calibre nmCLBIAS

Calibre nmCLBIAS is a curvilinear version of the production-hardened Calibre nmBIAS tool that provides smooth biasing results and quality rule-based retargeting for curvilinear designs.

Screenshot of a Calibre nmCLOPC giving model-based corrections on a semiconductor wafer
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Calibre nmCLOPC

Calibre nmCLOPC performs model-based optical proximity correction for curvilinear edges to achieve high fidelity, smooth and consistent output that is mask-rule clean.

Flow chart showing how Calibre nmCLMPC corrects, checks, formats, and models masks for production.
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Calibre nmCLMPC

Calibre nmCLMPC supports curvilinear mask process correction to meet the expectations for processing time and mask pattern fidelity of advanced node curvilinear mask manufacturing.

A collage of semiconductor wafer close-ups, showcasing intricate patterns and vibrant colors. The image highlights different types of integrated circuits (ICs) and chip layouts across multiple wafers. Some sections show reflective, rainbow-hued interference effects, while others display detailed grid structures with various microcircuitry blocks. The diverse layouts emphasize the complexity and precision of microchip manufacturing
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Calibre nmCLSRAF

Calibre nmCLSRAF can perform rule-based curvilinear SRAF insertion based on the inverse lithography (ILT) results generated from the Calibre ILT engine.

Close-up of a circular silicon wafer with a complex grid of microchips and circuits, showing intricate geometric patterns and lines. The wafer has a reflective, metallic surface with blue and green tones, highlighting the fine details of semiconductor technology.
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Calibre Curvilinear MDP

Calibre Curvilinear MDP product suite offers a complete mask data preparation flow for curvilinear masks and seamlessly connects for MPC, MDP, and OPC.