The Calibre curvilinear OPC engine can convert rectangular shapes into curvilinear patterns and make sure the EPE goal is achieved. It performs SRAF printing checks for curved shapes and applies MRC constraints simultaneously to ensure high-quality curvilinear mask generation.
Calibre nmCLOPC enables the hybrid ILT curvilinear OPC flow which delivers the required lithographic quality with a faster runtime than with a full ILT solution. This flow can be used to generate curvilinear masks needed for Silicon Photonics, or for rectilinear designs for logic or memory.
Unlike traditional OPC engines that rely on Manhattan edge movement, Calibre nmCLOPC applies native curvilinear polygon representation with Bezier splines and performs spline-based correction by moving an “OPC curve.” This new format not only benefits the accuracy improvement but also mitigates data size explosion introduced by curvilinear masks.
The Calibre OPC core model can accurately model the mask 3D electromagnetic field effects for curvilinear masks. The use of SEM contours for model calibration to curvilinear patterns allows it to describe the real behavior on wafer. The advanced Calibre nmCLOPC technology maximizes lithography entitlement and achieves the required OPC accuracy.
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Across all process nodes and design styles, the Calibre toolsuite delivers accurate, efficient, comprehensive IC verification and optimization, while minimizing resource usage and tapeout schedules.