Calibre nmCLMPC

Mask process correction (MPC) ensures the mask pattern fidelity of advanced node mask manufacturing. Calibre nmCLMPC provides the needed capability for curvilinear mask process correction to meet the expectations for correction accuracy as well as for processing time.

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Key features

Mask process correction (MPC) for curvilinear designs

Calibre nmCLMPC performs Mask Process Correction (MPC) for input layouts with curvilinear polygons, such as those produced by Inverse Lithography Technology (ILT) OPC, as well as silicon photonic structures.

Data size, accuracy and runtime

Innovative curvature-based fragmentation

The curvature-based fragmentation in Calibre nmCLMPC engine determines edge fragment length based on local curvature and provides output feasible for curvilinear MPC correction. This feature attempts to co-optimize file size, accuracy and execution time for curvilinear mask process correction.

Faster runtime and accuracy

Option to achieve fast convergence

Calibre nmCLMPC can be used with curvature-based pre-biasing to enable fast convergence for curvilinear MPC.  The curvature-based pre-bias method reduces the number of iterations required without degrading the correction accuracy and saves runtime.


Simultaneous correction capability

Calibre nmCLMPC can correct curvilinear and rectangular shapes in one run applying the same rules as in a standard recipe to the rectangular shapes.

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