Mask process correction (MPC) ensures the mask pattern fidelity of advanced node mask manufacturing. Calibre nmCLMPC provides the needed capability for curvilinear mask process correction to meet the expectations for correction accuracy as well as for processing time.
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Calibre nmCLMPC performs Mask Process Correction (MPC) for input layouts with curvilinear polygons, such as those produced by Inverse Lithography Technology (ILT) OPC, as well as silicon photonic structures.
The curvature-based fragmentation in Calibre nmCLMPC engine determines edge fragment length based on local curvature and provides output feasible for curvilinear MPC correction. This feature attempts to co-optimize file size, accuracy and execution time for curvilinear mask process correction.
Calibre nmCLMPC can be used with curvature-based pre-biasing to enable fast convergence for curvilinear MPC. The curvature-based pre-bias method reduces the number of iterations required without degrading the correction accuracy and saves runtime.
Calibre nmCLMPC can correct curvilinear and rectangular shapes in one run applying the same rules as in a standard recipe to the rectangular shapes.
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