The semiconductor industry depends on constant innovation and improvement to maintain the steady growth in integrated circuit (IC) design complexity and size while ensuring products can still be manufactured.
The Calibre shift-left strategy provides pioneering tools and techniques based on proven functionality that embed Calibre signoff-quality verification and optimization into the design flow far earlier, reducing signoff iterations and time to tapeout while ensuring Calibre-quality results.
Replacing the limited verification functionality provided by custom design and place and route (P&R) tools, a Calibre shift-left implementation gives designers and P&R engineers access to foundry-preferred, full-featured Calibre design verification functionality.
By understanding and applying best practices for the use of Calibre shift-left tools and taking advantage of new resource usage models, design companies can benefit from a Calibre shift-left implementation to realize faster iteration times and significantly reduced review and debug times, resulting in increased productivity, higher quality designs, and faster time to market.
Calibre shift-left resources can guide you through selecting and implementing the optimal strategy for your needs and help you better understand and optimize the use of Calibre shift-left tools and technology for the best results.
Calibre DesignEnhancer automated layout analysis delivers correct-by-construction layout optimizations during full custom design and P&R implementation to improve reliability and manufacturability while reducing time to market.
The Calibre RealTime Digital interface enables on-demand immediate Calibre DRC feedback for digital design flows, enabling P&R engineers to shave weeks off their tapeout schedule.
The Calibre RealTime Custom interface enables on-demand immediate Calibre DRC feedback for custom and analog/mixed-signal (AMS) design flows, improving DRC productivity by two to four times.
The Calibre nmDRC Recon technology lets design teams perform physical verification of full-chip design layouts during early stages in the design cycle, while different components are still immature.
The Calibre nmLVS Recon technology lets teams perform a rapid analysis of dirty designs to find and fix specific types of circuit violations earlier and faster, reducing signoff layout versus schematic (LVS) verification runs.
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Across all process nodes and design styles, the Calibre toolsuite delivers accurate, efficient, comprehensive IC verification and optimization, while minimizing resource usage and tapeout schedules.