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Calibre Mask Process Correction

The Calibre Mask Process Correction family of rule and model-based products is used in advanced photomask manufacturing to correct for systematic mask lithography and process error sources to ensure that the mask critical dimension signature is within specification.

{"items":[],"resource":{"ids":["2QD5wI57Gc9dgMFaDGHCsV"],"mode":"selected","query":{"q":"Siemens-validation-for-multi-beam-mask-lithography-WP-82974","sorts":[{"field":"publishedDate","order":"desc"}],"filters":[{"field":"collection","values":["resource"],"operator":"OR"}],"postFilters":[],"verboseLocalization":true},"idsQuery":{"size":1,"filters":[{"field":"collection","values":["resource"],"operator":"OR"},{"field":"id","values":["2QD5wI57Gc9dgMFaDGHCsV"],"operator":"OR"}],"verboseLocalization":true}},"env":"master"}

Calibre Mask Process Correction Products

Calibre Mask Process Correction rule and model-based products provide best in class scalability and accuracy to correct error sources from the nanometer to the centimeter range for electron scatter and process loading effects. Advanced modeling tools allow model calibration to <1 nm accuracy.

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