Calibre Mask Data Preparation (MDP) tools enable mask data format conversion and verification for mask fabrication including the latest multi-beam mask formats in a fully compatible Calibre platform.
Calibre Mask Data Preparation products are part of the integrated Calibre platform, enabling you to complete all resolution enhancement processing and mask data format conversion tasks in one mask fabrication batch run using a single control language with best-in-class performance.
Exports mask making data directly to target mask writing formats without changing tools or creating large intermediate files. Supported formats include MEBES, JEOL, Micronic, NuFlare VSB and MBF, OASIS.MASK, and OASIS.MBW.
Checks final mask writer data against the original GDSII or OASIS definition. It supports tracking of design updates by confirming the presence of changes in the final mask data.
Enables quick and easy review of design data in GDSII and OASIS format, as well as in all popular mask writer pattern formats and data assemblies through the respective job decks.
Reduces mask cost and mask writing time by lowering the total shot count through advanced pre-processing of the fractured data.
Enables highly scalable cross-chip merging for NuFlare VSB11 fracture.
Extends the tcl programming language set available in Calibre MDPview with dedicated functions supporting the extraction and validation of suitable locations for mask metrology.