Calibre Defect Management solutions perform pattern-matching based defect grouping and leverage DRC/LVS for defect-location based design attributes and net criticality analysis. The seamless integration with design tools facilitates direct connection between physical design and defect inspection.
Calibre Defect Management GUI integrates various Calibre design analysis functionalities and provides different defect-based design guided analysis features so users can easily identify and fix the root cause of the defects.
Calibre Defect Management provides down sampling applications by integrating with Calibre SONR techniques, a machine-learning based ranking and prediction methodology, to improve defect hit rate and highlight systematic patterns with limited sampling budget for SEM review.
Calibre Defect Management SEM image processing capability enables accurate anchoring between the defect location on the mask/wafer and the defect location on the layout. Techniques such as SEM-to-layout alignment, contour extraction, and SEM-based auto defect classification are used to ensure the accurate defect analysis.
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Across all process nodes and design styles, the Calibre toolsuite delivers accurate, efficient, comprehensive IC verification and optimization, while minimizing resource usage and tapeout schedules.