Overview

Calibre Curvilinear MDP

Multi-beam mask writer technology evolution drives the rapid growth of curvilinear photomask application for advanced nodes. Calibre Curvilinear MDP provides a complete curvilinear mask data preparation (CLMDP) solution in fracture, verification, and viewing for the new multi-beam fracture formats.

Technical Paper

Curvilinear data format working group for the MBMW era

Multi-beam mask writers (MBMW) enable the use of ideal curvilinear shapes for inverse lithography (ILT) masks, but current layout formats are not sufficient to represent complex ILT designs efficiently from optical proximity correction (OPC) through mask making. In 2019, we initiated a data format working group to address the need for curvilinear data representation for MBMW. The Curvilinear Data Format working group has members from EDA companies and advanced mask makers. In this paper, the necessity of a new curvilinear data format and the goals of our working group will be introduced. We will discuss the progress and the plan of the working group. A version of this paper was presented at the IEEE SPIE conference in 2021 and published in the conference proceedings.

Examples of curvilinear mask layouts and corresponding mask SEM images written with MBMW
Key Features

Multigon Based Fracture for Curvilinear MDP

Calibre Curvilinear MDP supports multi-beam fracture format based on multigons, which allows to maintain the benefits of native curve representation all the way to the multi-beam mask writer.

Related resources

FAQ

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