Calibre Computational Lithography
The insatiable demand for integrated circuits (ICs) continues to drive smaller critical dimensions. Photolithography processes, including extreme ultraviolet (EUV), present ever more complexity and data volume. Our computational lithography solutions enable cost-effective technology enablement.
Calibre Computational Lithography Products
Both the lithographic challenges and the computational complexity associated with advanced process nodes create a need for advanced capabilities in computational lithography software and hardware. The Calibre solution offers best-in-class accuracy, speed, and cost of ownership.
Calibre nmOPC
Dense optical proximity and process correction to enable deep submicron manufacturing.
Calibre nmSRAF
Inserts sub-resolution assist features (SRAFs) into a design.
Calibre WORKbench
GUI used to launch a wide variety of applications and to view results.
Calibre nmModelflow
Highly-scalable calibration engine for optical, resist and etch models.
Calibre pxOPC
Fast, inverse pixel-based optical proximity correction.
Calibre pxSMO and RET Selection
Easy to use GUI for optimization of illumination source.